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Advanced litho and Yan Borodovsky of the manufacturing department of Intel show, Intel can hope for EUV or maskless beamwriter lithography as 193 immersion litho in 11 person who mend, and claim 11 nanometers might happen in 2015. Borodovsky shows 193nm immersion type photoetching technique may extend to 22nm and 16nm in 2011 and 2013 separately. In Niko